Substrate Heating - Substrat chauffage

Substrate Heating - Substrat chauffage

 

Heater: Ta/W
Maximum temperature: 1000°C
Thermal couple: K-type
Substrate size: 1-4 inch


Maximum temperature in oxidizing atmosphere: 1000°C
Long life in oxidizing atmosphere
Continuous using: 2000 hours
Fast heat up, small deformation, easy of use
Thermal couple: K-type
Substrate size: 1-4 inch


 

Electron bombardment heating
W or Iridium filament
High voltage: 0-1000 V
Maximum temperature: 2500°C
Thermal couple: K-type
Substrate size: 1 inch


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